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Guideline for Characterizing Solder Bump Electromigration under Constant Current and Temperature Stress

contributor authorJEDEC - Solid State Technology Association
date accessioned2017-09-04T18:02:31Z
date available2017-09-04T18:02:31Z
date copyright01/01/2008
date issued2008
identifier otherGCDJCCAAAAAAAAAA.pdf
identifier urihttps://lib.yabesh.ir/std/handle/yse/185559
description abstractThis document describes a method to test the electromigration (EM) susceptibility of solder bumps, including other types of bumps, such as solder capped copper pillars, used in flip-chip packages. The method is valid for Sn/Pb eutectic, high Pb, and Pb-free solder bumps. The document discusses the advantages and concerns associated with EM testing, as well as options for data analysis. 
languageEnglish
titleJEDEC JEP154num
titleGuideline for Characterizing Solder Bump Electromigration under Constant Current and Temperature Stressen
typestandard
page30
statusActive
treeJEDEC - Solid State Technology Association:;2008
contenttypefulltext
subject keywordspro


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